장비통합 검색/신청

장비상세보기

(FE-SEM, EDS, EBSD) 후방산란전자회절장치

Electron Backscatter Diffraction System

  • 시설장비활용번호 : Z-kitech-00854
  • 시설장비등록번호 : NFEC-2015-11-205883
  • 활용범위 : 공동활용서비스
  • 활용대상 : 기관외부활용
  • 예약방법 : 실시간예약
  • 관심장비등록 카달로그 메뉴얼
문의번호 ( 한국생산기술연구원 )
  • 예약문의 032-458-5111
  • 장비문의 032-458-5111
  • 장비활용중개소
    (ZEUS)
    1670-0925 ※ 운영시간 (09:00~18:00)
이용 요금
  • 이용요금 FE,SEM
  • 이용료 안내 FE,SEM
  • 이용방법 상담 후 예약
  • 제작사명 Jeol
  • 모델명 JSM-7100F
  • 구축일자 2015-10-22
  • 사용용도 시험
  • 탄소공정 시험/평가
  • 5대수요산업 모빌리티 ,에너지환경 ,라이프케어 ,방산·우주·항공 ,건설
  • 6대 탄소소재 탄소섬유 ,활성탄소 ,인조흑연 ,카본블랙,탄소나노튜브,그래핀
  • 설치장소 한국생산기술연구원 인천지역본부 송도TP
사용/활용예
  • 사용/활용예 해당 장비는 아래와 같은 분야에 활용될 수 있다. -주사전자현미경 기반 미세조직분석 -결정립도 정량파악 -조직 내 결정구조 분포 -Mis-orientation Angle 분포 결정상(Crystal Phase) 분산도
  • 장비설명 Specifications 1. Performance 1) Resolution For High Resolution condition: 1.2nm guaranteed at 30 kV or better 2.0nm guaranteed at 1 kV or better For analytical condition: 3.0nm guaranteed at 15 kV, WD 10mm, 5nA or better Gentle beam Mode: Built-in 2) Magnification : x10 to x1,000,000 or wider Magnification preset : User can be switch instantaneously from any magnification to any preset magnification. 3) Image modes : SEI, BEI 2. Electron Optical System 1) Accelerating voltage : 0.2 to 30 kV or berrer 2) Electron Gun: ZrO/W(100)Shottky type Filament Built-in 3) Gun Bias Auto and Manual mode. 4) Probe current : Up to 2 x 10-7A at 15kV or better 5) Alignment : Mechanical and electromagnetic deflection (Mechanical alignment by user can not be required)
  • 구성 및 성능 Features 1. High resolution field emission scanning electron microscope which schottky type FEG for the electron source should be permited 1.2nm guaranteed resolution at 30 KV and 2.0nm guaranteed resolution at 1KV and 3.0nm guaranteed analytical condition resolution or better. 2. The Schottky type Field Emission Electron Gun for the electron source should be employed to display high resolution image and analytical functions. 3. The electron beam probe current should be irradiated to analyze small area from the order 1 x 10-12A order to 2 x 10-7A. 4. The Specimen chamber is designed to introduce a large specimen of 100mm diameter and 40mm Height sample through the Airlock Chamber and also it is designed to enable various analytical devices such as EDS, WDS, EBSD, E-Beam litho. system and Backscattered electron detector. 5. For high-resolution observations, employ the GB(Gentlebeam) mode that effectively suppresses charging in non-conductive specimens such as insulating materials (ceramics, etc.) and semicondu